




Dr. Althea 345 Relief Cream Mask
Please rest assured that both the Korean and translated packaging contain the exact same product formula.
可於 66 Ainslie St 取貨
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Dr. Althea 345 Relief Cream Mask
1 Sheet
66 Ainslie St
66 Ainslie Street
Store B
Brooklyn NY 11211
美國
81 Mott Street Frnt 2
81 Mott Street
Frnt 2
New york NY 10013
美國
25g * 1 Sheet or Box (4 Sheets)
The 345 Relief Cream mask combines 3 blemish-fighting, 4 nourishing, and 5 soothing ingredients to calm irritated skin and support its natural recovery. The high-adherence vegan cellulose sheet absorbs quickly, delivering clinically proven hydration where you need it most. Enriched with 30% tea tree leaf water and 3 centella-derived actives, it's designed to soothe post-acne skin and restore comfort.
How To Use
1. Cleanse your face and prep your skin with toner.
2. Take the sheet mask out of the pouch and unfold it.
3. Apply the sheet mask evenly over your face.
4. Leave it on for 10–15 minutes, then gently pat the remaining essence into your skin for better absorption.
Ingredients
Aqua (Water), Tea Tree Leaf Water, Methylpropanediol, 1, 2-Hexanediol, Butylene Glycol, Glycerin, Niacinamide, Octyldodeceth-16, Triethylhexanoin, Caprylic/Capric Triglyceride, Pentylene Glycol, Carbomer, Hydroxyethylcellulose, Tromethamine, Allantoin, Trehalose, Caprylyl Glycol, Ethylhexylglycerin, Dipotassium-Glycyrrhizate, Disodium EDTA, Panthenol, Soybean Seed-Extract, Sodium Hyaluronate, Hydrolyzed Hyaluronic Acid, Pantothenic Acid, Centella Asiatica Leaf Water, Cyclodextrin, Centella-Asiatica Extract, Hydrogenated Lecithin, Madecassoside, Ceramide NP, Cholesterol, Camellia Sinensis Leaf Water, Resveratrol, Beta-Glucan, Sodium DNA, Nelumbo Nucifera Leaf Extract
This list of ingredients represents all options or variants of this product. Actual ingredients in a given product option may vary from this list. Ingredients subject to change at manufacturer's discretion. For the most complete and up-to-date list of ingredients, please refer to product packaging.
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